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Polishing Pad

Suede

Features Applications

Suede type polishing pad is co-developed product with TORAY Coatex Co., Ltd. for final mirror polishing applications that provides the high polishing performance.

We have a lineup of products that according to the purpose of such as a hydrophilic and chemical resistance, also we support a wide range on the surface processing (buffing, embossing, etc.) in accordance with the customer’s request.

Silicon wafer
Sapphire wafer
Compound wafer
Optical lens
Glass
Other

Non-woven Fabric

Features Applications

Including the various final polishing application, this polishing pad is used for lapping and stock polishing application.

Non-woven fabric of a single structure has combines the wear resistance, durability and flexibility, and we have a lineup of products in accordance with the purpose, such as hardness and chemical resistance.

Silicon wafer
Sapphire wafer
Compound wafer
Metal
Other
 

Hard Urethane

Features Applications

This type of polishing pad is made by mixing and dispersing an abrasive in a special urethane resin, so it has excellent durability and chemical resistance ability.

Therefore, this pad is used for glass, lens and ceramic polishing application.

There is also the type that does not contain abrasive and grooving we will correspond each size.

Glass
Lens
Ceramic
Other
 
 

Wiping Cloths

Five Features

Materials for Industrial Products

Primary Use
Material for spacer
Material for household appliances parts
Cushion material

Please contact us for more information about each product. We will suggest the best product to meet your request.